Canon has made a breakthrough it says can help manufacture the world’s most advanced semiconductors. The company’s latest nanoimprint lithography (NIL) system challenges Dutch firm ASML, to date the leader in extreme ultraviolet (EUV) lithography technology. ASML creates tech used in TSMC’s chips made for Apple iPhones. Canon says its FPA-1200NZ2C nanoimprint semiconductor manufacturing equipment can produce chips equivalent to a 5-nanometer process, the current state of the art, and with further improvement expects to enable circuit patterning corresponds to 2nm nodes. The new equipment is also energy efficient, Canon says. Continue reading Canon Litho Breakthrough May Advance Global Chipmaking